A novel high-pressure carbon dioxide (CO 2 ) spin-coating apparatus was designed and constructed to produce high-quality thin films of CO 2 -soluble photoresists based on 1 H,1 H -perfluorooctyl methacrylate/ tert -butyl methacrylate copolymers. Film thicknesses were correlated to various process variables including rotational speed, solution viscosity, and evaporative driving force. The effects of these operating conditions on the film thickness and uniformity were compared to those of a theoretical model adapted for spin coating in CO 2 . Excellent correlation was found between the theoretical predictions and observed film properties, with the final films being of sufficient quality for use in photolithography. The potential of this spin-coating process in CO 2 for developing a novel “dry lithography” is discussed.
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Hoggan et al. (2004) studied this question.
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