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The effects of pressure and temperature on the O–Ge and I–Ge surface reaction systems were studied by means of low-energy electron-diffraction with single-crystal (100) and (111) surfaces. The results are very similar to those reported for silicon, but have a displacement to lower temperatures of about 350°C. On both surfaces the oxide films are amorphous, but well-crystallized two-dimensional iodide structures were obtained and the transitions to the iodides are ``reconstructive.'' The slopes for all four transitions from the ``clean'' surfaces correspond to energies of about 55 kcal/mole. Clustering phenomena are also discussed.
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Lander et al. (1963) studied this question.
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