One-dimensional semiconductor nanofibers are regarded as ideal materials for electronics due to their distinctive morphology and characteristics. In this work, La-doped indium oxide (LaInO) nanofibers are fabricated as the channel layer to reduce O vacancies and the density of interface trap states; this is clearly confirmed by investigating the stability under positive bias stress and the capacitance–voltage for field-effect transistors (FETs). The In 2 O 3 nanofiber FETs optimized by doping with 5 mol% La exhibit excellent electrical performance with a mobility of 4.95 cm 2 V –1 s –1 and an on/off current ratio of 1.1 × 10 8 . In order to further enhance the electrical performance of LaInO nanofiber FETs, ZrAlO x film, which has a high dielectric constant, is employed as the insulator for the LaInO nanofiber FETs. The LaInO nanofiber FETs with ZrAlO x insulator have a high mobility of 13.5 cm 2 V –1 s –1 . These findings clearly indicate the great promise of La-doped In 2 O 3 nanofibers in future one-dimensional nanoelectronics.
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Chen et al. (2019) studied this question.
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