Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm

Recent advancements in photonics have intensified the performance requirements for optical systems and present significant challenges for optical coating technologies. Conventional interference coating systems often prove to be insufficient, especially in applications requiring large angles of light incidence or a wide wavelength range. Nanostructures, which consist of an air material mixture, offer promising alternatives. In this work, silica nanostructures are manufactured by the AR-plas2 method, in which first an organic layer is evaporated onto a substrate. This organic layer forms self-organizing nanostructures by a plasma etching step, which are subsequently coated with silica. Finally, the organic residues are removed by additional plasma etching and heat treatment steps, which results in hollow silica structures. The work examines the optical and functional properties of these structures designed for 355 nm to demonstrate their use as anti-reflective coatings for advanced optical systems.