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Materials study demonstrates controlled titania film growth on functionalized silicon substrates, highlighting low-temperature methods for coating delicate materials.
Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55 °C) and pH (2.88−3.88), can produce thin (0.1−1.0 μm), adherent titania (TiO 2 ) films. This paper reports a systematic study of LPD TiO 2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.
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Pizem et al. (2002) studied this question.
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