Answers are grounded in this paper and cite their sources.
Optical properties of RF-sputtered silicon oxide films is studied as a function of sputtering voltage, film thickness and heat treatment conditions. The wavelength of 9-µm absorption band becomes shorter with increasing sputtering voltage and film thickness for as-sputtered films, but this is not the case for films heat-treated above 700°C in Ar. This phenomenon can be explained by oxygen deficiency in the sputtered films, the degree of which is estimated at 6% after the heat-treatment.
No takes yet. Share an insight, caveat, or question.
Kubota et al. (1972) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: