Beam Size in A High-Resolution Ion Microprobe Operated at High Current

J. Orloff; L. W. Swanson; Jiazhen Li; Dave Tuggle

doi:10.1017/s0424820100135162

August 12, 1990Proceedings annual meeting Electron Microscopy Society of America

Beam Size in A High-Resolution Ion Microprobe Operated at High Current

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Key Points

Characterize the beam size and operational parameters of liquid metal ion source microprobes when driven at high currents.
Evaluated liquid metal ion source optics across diverse ion species including gallium, indium, beryllium, gold, silicon, arsenic, and boron.
Assessed beam focus performance yielding spot diameters from below 50 nanometers to several micrometers at current densities of multiple amperes per square centimeter.
Liquid metal ion sources produced high angular intensities of roughly 20 microamperes per steradian with apparent source sizes near 50 nanometers.
High-current focused ion beams enabled reliable nanoscale surface micromachining, failure analysis, and localized gas-assisted metal deposition on microcircuits.

Implication

Technical evaluation demonstrates high current density and nanometer-scale resolution in liquid metal ion beams, indicating broad utility for precision semiconductor micromachining.

Abstract

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Cite This Study

Orloff et al. (1990) studied this question.

synapsesocial.com/papers/6a91749a9ea92d4f71f084c6 https://doi.org/10.1017/s0424820100135162

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Beam Size in A High-Resolution Ion Microprobe Operated at High Current

Key Points

Implication

Abstract

Discussion

Cite This Study

Beam Size in A High-Resolution Ion Microprobe Operated at High Current

Key Points

Implication

Abstract

Discussion

Cite This Study

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