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We describe an optical-lithography-based sample preparation technique for measuring the current-perpendicular-to-plane (CPP) magnetoresistance with micron-size current-contact areas on top of magnetic multilayer samples of millimeter in-plane size. We use Permalloy and Co91Fe9 exchange bias spin valves to show that the CPP specific magnetoresistance (area times change in resistance) is independent of the contact area size A over the range 4 μm2⩽A⩽1 mm2.
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Slater et al. (2001) studied this question.
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