We have extended the chemical bath deposition technique modified by microwave irradiation to rapidly deposit ternary oxide Eu:YVO 4 thin films. The obtained films are dense, adherent, and mirror-like. Structure (XRD), morphological (TEM), and optical (UV–vis–NIR and PL) characterizations of the films are presented. The results indicate that the deposited Eu:YVO 4 films with (002) preferential orientation consisted of nano-size grains and had strong emission under UV excitation. The kinetic mechanism of this novel solution processing has been investigated.
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Xu et al. (2004) studied this question.
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