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Threshold power densities for electron-beam-stabilized discharge excitation of XeF and KrF lasers are reported for Ar+Kr+F2 and Ar+Xe+NF3 gas mixtures at 1 atm. Stable discharges were obtained with these gas mixtures for times greater than 0.5 μsec with lasing pulse width as long as 0.5 μsec. An analysis of data for several different pump power densities is presented which indicates that the threshold pump power density varies inversely with the cavity buildup time.
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Fisher et al. (1977) studied this question.
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