The point defect model that was previously developed (1) to explain the growth kinetics of a passive film has been extended to account for chemical breakdown. This model provides quantitative explanations of the dependence of breakdown potential on halide concentration, and of the incubation time‐breakdown overpotential relationships that have been observed for iron and nickel in aqueous solutions. Limitations of the model are identified and discussed.
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Lin et al. (1981) studied this question.