Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
October 17, 2018Advanced Materials InterfacesOpen Access

Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

View Full Paper
Ask AI
Bookmark
Share

Authors

JSJob SoethoudtImec the NetherlandsFGFabio GrilloDelft University of TechnologyEMEsteban A. MarquesSpetec (Germany)

Discussion

Loading...

Member takes

Overview

Key Points

Key points are not available for this paper at this time.

Cite This Study

Soethoudt et al. (2018) studied this question.

synapsesocial.com/papers/6a92d17dfa60aefc093ad7aehttps://doi.org/10.1002/admi.201800870
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Atomic Layer Deposition of Noble Metals and Their Oxides2013 · 365 citations
  2. 2An IR and NMR study of the chemisorption of titanium tetrachloride on silica1993 · 273 citations
  3. 3Influence of Oxygen Exposure on the Nucleation of Platinum Atomic Layer Deposition: Consequences for Film Growth, Nanopatterning, and Nanoparticle Synthesis2013 · 146 citations
  4. 4Thermal Stability of Hydroxyl Groups on a Well-Defined Silica Surface1995 · 223 citations
  5. 5Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process2005 · 2,621 citations