Silver halide‐chalcogenide glass composite thin film structures are evaluated as inorganic x‐ray resists at Al line. The sensitivity is shown to be a factor of 2 better than the PMMA 2041 for a 300 nm thick resist layer. A comparable contrast is indicated. A high resolution capability is expected because of the amorphous nature of the composite. A possible mechanism of this inorganic resist action is discussed.
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Kolwicz et al. (1980) studied this question.