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Poly(olefin sulfones) have been shown to represent a new class of positive electron beam resists exhibiting sensitivities in the region of coulombs cm −2 . Processing variables have been evaluated and exposure characteristics determined. These materials can be used in two development modes, (i) as a conventional solvent‐developed system and (ii) as a system which self develops during e‐beam irradiation by depolymerization followed by vaporization. Limitations of this "vapor development" process are discussed.
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Thompson et al. (1973) studied this question.
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