A series of programs have been developed and linked together for doing advanced transistor modeling. The strategy begins with a process modeling program, SAFEPRO, for predicting two-dimensional impurity profiles. These are input to a two-dimensional device physics modeling program, 2DP, for generating device electrical characteristics. A three-dimensional distributed device model is then assembled by a model generator program (MGP) which, in turn, is used to derive a lumped equivalent-circuit model for numerical circuit analysis. The tools make it possible to do process sensitivity studies, perform process and device optimization, and provide early feedback on technology performance. The approach has recently been used to examine and compare various technologies at IBM.
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Knepper et al. (1985) studied this question.
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