Structure and Topography of Monocrystalline Nickel Thin Films Grown by Vapor Deposition

Monocrystalline nickel thin films were grown by vapor deposition onto heated rocksalt substrates. The (100)-, (110)-, and (111)-oriented nickel films were prepared by deposition onto (100)-, (110)-, and (111)-oriented rocksalt substrates, respectively. The structures of the films were examined by x-ray diffraction and electron diffraction and microscopy. These thin films (less than 1000 Å thick) were well oriented and continuous and contained relatively high densities (108−1011/cm2) of stacking faults, twins, and dislocations. Ledges parallel to the 〈001〉 were found on (100)-oriented films and {111} facets along 〈11̄0〉 were found on (110)- oriented films. The (111)-oriented films were quite rough with pits, mounds, and other ledges. These films were satisfactory for investigations on the initial stages of oxidation and catalysis.