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The construction of a gun capable of producing a microfocused (FWHM=5 μm) beam of Ar atoms at 10 keV for use in secondary electron and SIMS imaging of insulating samples is described. The design is based on the principle of neutralizing an ion beam by charge transfer subsequent to rastering and microfocusing, and therefore utilizes a final focusing lens with long working distance (60 mm). Neutral beam intensities of up to 20% of the focused ion beam can be produced. The performance of the gun is illustrated by secondary-electron and secondary-ion images of insulators.
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Eccles et al. (1986) studied this question.
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