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In this work, the time-dependence of Si/SiO/sub 2/ interface trap formation is considered by solving an improved set of Si-H defect kinetics equations that take into account interface disorder and the Si-H bond activation energy evolution as the bonds are broken. This model is applied to the simulation of metal oxide semiconductor field effect transistor (MOSFET) high field and hot carrier degradation, and then verified with various experimental data. An estimation of the potential barrier of the Si/SiO/sub 2/ interface is given.
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Penzin et al. (2003) studied this question.
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