In this paper, extended object-oriented Petri nets (EOPNs) are proposed for the effective modelling of semiconductor wafer fabrication systems (SWFSs). To cope with their complexity in terms of the re-entrant process route and the mixed production mode, a special type of transition called main-bus gate is introduced, which may lead each kind of product to undergo every re-entrant processing stage. In addition, the hierarchical approach is also applied to cope with the complexity. An etching area that processes 0.25 µm logic IC products is taken as an illustration to present the detailed modelling procedures by EOPNs, and the resulting model validates that the EOPNs may cope well with complex SWFSs modelling.
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Liu et al. (2005) studied this question.
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