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November 1, 1968Japanese Journal of Applied PhysicsOpen Access

Solid-Solid Diffusion of Boron in Silicon Using Reactive Sputtering

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Authors

KNK. NaganoSony (Taiwan)SIShigeki IwauchiSophia UniversityTTToshio TanakaDaikin (United States)

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Nagano et al. (1968) studied this question.

synapsesocial.com/papers/6a9450028a4c78aef331a07dhttps://doi.org/10.1143/jjap.7.1361
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  5. 5Diffusion from a Plane, Finite Source into a Second Phase with Special Reference to Oxide-Film Diffusion Sources on Silicon1968 · 9 citations