GaN islanding by spontaneous rearrangement of a strained two-dimensional layer on (0001) AlN

It is shown that a two-dimensional GaN layer grown on (0001) AlN under Ga-rich conditions remains two-dimensional while annealing under a Ga flux due to a surfactant effect of Ga. In contrast, further annealing under vacuum without the Ga flux leads to evaporation of excess Ga and to spontaneous transformation of the GaN layer into islands if the initial layer is thicker than about 2.5 monolayers. The resulting morphology is studied by atomic force microscopy and transmission electron microscopy. The latter reveals that these islands sit on top of a continuous 2.5 monolayer thick wetting layer, i.e., they represent a Stranski–Krastanow structure.