Layer-by-layer growth of GaN induced by silicon

We present in situ x-ray scattering studies of surface morphology evolution during metal–organic chemical vapor deposition of GaN. Dosing the GaN(0001) surface with Si is shown to change the growth mode from step-flow to layer-by-layer over a wide temperature range. Annealing of highly doped layers causes Si to segregate to the surface, which also induces layer-by-layer growth.