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November 1, 2001physica status solidi (b)

MOCVD Growth of High-Quality InN Films and Raman Characterization of Residual Stress Effects

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Authors

EKEiji KurimotoMeijo UniversityHHHisatomo HarimaKobe UniversityAHAkihiro HashimotoUniversity of Fukui

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Kurimoto et al. (2001) studied this question.

synapsesocial.com/papers/6a945de00a0ecd2722c51a07https://doi.org/10.1002/1521-3951(200111)228:1<1::aid-pssb1>3.0.co;2-u
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