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November 1, 1996Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Analysis of distortion in interferometric lithography

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Authors

JFJ. Mariano FerreraUniversidad Complutense de Madrid MSMark L. SchattenburgMassachusetts Institute of Technology HSHenry I. SmithLumArray (United States)

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Cite This Study

Ferrera et al. (1996) studied this question.

synapsesocial.com/papers/6a946086cff80aed1b3ed568 https://doi.org/10.1116/1.588633

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