When a grating is viewed by scanning electron microscopy, a moiré pattern is observed. Applications of the moiré phenomenon in scanning-electron-beam lithography and microscopy are discussed, including adjustment of the spatial period and angle of a scan raster, analysis of distortion in a scan raster, analysis of stray-field beam deflection and measurement errors, and registration of a scan field relative to coded patterns on a substrate.
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Smith et al. (1975) studied this question.
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