Quantum lithography with classical light: Generation of arbitrary patterns

Based on our previous scheme [Hemmer et al., Phys. Rev. Lett. 96, 163603 (2006)] we show the procedures to obtain any one- or two-dimensional pattern by multiple exposures. A key modification to the resonance condition is made to achieve subwavelength pattern resolution. The level separation of the substrate does not pose an upper limit to the frequency summation. So the fundamental frequency can be high and the number of Fourier terms can be large, making our scheme very suitable for subwavelength arbitrary patterns.