Answers are grounded in this paper and cite their sources.
A delay-locked loop is used in a one-dimensional demonstration of the global-fiducial-grid mode of spatial-phase-locked electron-beam lithography. A pattern-placement precision of σ∼5 nm is demonstrated under nonideal conditions. Results compare well with numerical simulations.
No takes yet. Share an insight, caveat, or question.
Goodberlet et al. (1997) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: