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Thin films of silicon monoxide have been deposited on alumina surfaces and examined by inelastic electron tunneling spectroscopy. A strong absorption peak at 2210 cm−1 reveals the formation of SiH bonds in the presence of trace amounts of water. It is inferred that a reaction between SiO and –OH groups to yield SiH bonds is catalyzed by the alumina surface.
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Eib et al. (1979) studied this question.
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