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April 1, 2004IEEE Transactions on Plasma Science

Modeling of N ₂ –H ₂ Capacitively Coupled Plasma for Low-k Material Etching

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Authors

CSC.H. ShonKorea Electrotechnology Research InstituteTMToshiaki MakabeKeio University

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Shon et al. (2004) studied this question.

synapsesocial.com/papers/6a950ff3f127e75f5b828af6https://doi.org/10.1109/tps.2004.828121
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