Site-Selective Deposition of In2O3 Using a Self-Assembled Monolayer

We developed a micropattern of transparent conducting In 2 O 3 thin films in an aqueous solution without an etching process. Molecular recognition of a self-assembled monolayer was effectively utilized for site-selective deposition of In 2 O 3 thin films. This novel system allowed us to realize liquid-phase patterning of transparent conducting In 2 O 3 thin films without degradation of its high performance in the etching process. Indium ions in the residual solution can be used for In 2 O 3 film formation repeatedly. Indium feedstock can be transformed to In 2 O 3 in a 100% yield. This process also has the advantage of green chemistry such as an environmentally friendly process, ordinary temperature process, and atmospheric pressure process, without the use of a toxic acid etchant. The process offers a novel direction for the design of future materials and devices with high performance and environmental harmony.