Improvement to reflective dielectric film color pictures

This paper presents methods used to improve reflective dielectric film color pictures. These changes include improvements in color purity, increased brightness, and elimination of any light absorption within the film layers. The color picture is fabricated by varying the silicon dioxide film thicknesses across a silicon wafer and coating the entire wafer with a thin layer of silicon nitride. In addition to the demonstration of fabricated color pictures, we also present more detailed calculation of basis colors and provide details of the fabrication process.