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Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage, Rakhimova, T V, Lopaev, D V, Mankelevich, Yu A, Rakhimov, A T, Zyryanov, S M, Kurchikov, K A, Novikova, N N, Baklanov, M R
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Рахимова et al. (2015) studied this question.
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