Study of growth kinetics and behaviour of particles in a helium-silane RF plasma using laser diagnostic methods

Growth kinetics and behaviours of particles in a He-SiH 4 plasma are observed using the RF modulation method together with two in situ laser diagnostic methods. Particles tend to be sustained around the plasma/sheath boundary near the RF electrode, their size and density being 60-180 nm and 10 8 -10 9 cm -3 , and larger particles exist in a higher electric field region near the RF electrode. The particle growth rate is explained by taking into account the contribution of radical ion and/or radical fluxes. The particle trapping around the sheath edge is explained by balance between the electrostatic force and the ion drag force. An effect of the viscous force on the particles and a suppression mechanism for RF-modulated discharges are also discussed.