Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

To realize submicron focusing of hard X-rays, elliptical mirrors were manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Line focused X-ray beam profiles of each mirror was evaluated at the 1-km-long beamline of SPring-8, and this showed nearly diffraction-limited performances were achieved. A Kirkpatrick–Baez mirror unit equipping an automatic optical alignment system, in which the fabricated mirrors were used, was designed, constructed and confirmed to enable 200 × 200 nm 2 focusing of 15 keV X-ray.