A numerically controlled plasma chemical vaporization machining (CVM) machine has been developed in order to fabricate ultrahigh accuracy x-ray mirror efficiently without making the deformed layer. In this machine, a gas bearing was applied to both of the rotary electrode for plasma generation and an XY table in order to maintain the cleanliness of the machining atmosphere. A silicon flat mirror for the x-ray was made by using developed machine. A value of 22.5 nm (p–v) was achieved as flatness. The CVM technique is more fully described in the accompanying article in this issue.
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Mori et al. (2000) studied this question.
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