The turbostratic structure of boron carbonitride (BCN) films with various compositions synthesized by bias-assisted hot-filament chemical-vapor deposition was studied by x-ray diffraction and high-resolution transmission electron microscopy. Boron atoms can be incorporated into the turbostratic structure with a concentration up to 70%, and the interplanar spacing 3.49 Å is independent of the film compositions in this range. Field-emission behavior of the BCN films is characterized. A low threshold electric field of 4 V/μm and maximum emission current of 0.31 mA are obtained, which suggest a new candidate as a field-emitting material.
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Yu et al. (1999) studied this question.
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