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The multipurpose mask set described, which consists of three stepper reticles, contains 95% of all test structures required for CMOS process development and random defect detection, thereby dramatically reducing the stepper reticle inventory and the frequency of reticle changes. Realizing the mask set by two dozen standard unit processes minimizes the feedback loop for defect density data, parametric data and unit process data.>
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Charles M. Weber (1992) studied this question.
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