Patterned Metal Electrodeposition Using an Alkanethiolate Mask

Alkanethiolate films were used as templates for patterned electrodeposition of metal structures with micrometer dimensions. Two patterning schemes were implemented, contact printing of a C 16 H 33 SH film and mechanical scribing micrometer wide grooves in a self‐assembled C 16 H 33 SH monolayer film. A thin film of nickel was then electrodeposited on film‐free areas of the copper and gold substrates. The alkanethiolate template can also be used as a mask for chemical etching. This was demonstrated by etching C 16 H 33 SH patterned copper substrates. More complex structures can be built by combining both deposition and etching processes.