InP-based InAs/InGaAs quantum wells with type-I emission beyond 3 μm

This work reports on InAs/In0.53Ga0.47As strain compensated quantum well structures on InP-based metamorphic buffer to generate the type-I emission of beyond 3 μm. The metamorphic buffer is composed of InxAl1−xAs graded layer and In0.8Ga0.2As virtual substrate layer. Atomic force microscope, transmission electron microscope and x-ray diffraction measurements show the moderate surface and structural properties. A photoluminescence signal up to 3.05 μm has been achieved at 300 K, which is one of the longest wavelengths from the interband emission of InP-based antimony-free structure. It is promising to employ this quantum well structure on metamorphic buffer for the laser demonstration with emission around 3 μm.