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Plasma electroreflectance spectra (1.2 to 2.2 eV) and the bias dependence of capacitance are presented for InN semimetallic (N ≈ 3 × 1020 cm−3) thin films. The interference patterns in the electroreflectance spectra are analysed and grouped into two types according to the form of the electroreflectance undulations. From capacitance measurements the Fermi energy is determined to EF = (0.4 ± 0.1) eV. The contribution of Friedel oscillations to the capacitance is also discussed.
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Tyagai et al. (1981) studied this question.
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