Interdiffusion in Fe–Ti, Ag–Bi, Fe–Mo, Ni–Si, Mo–Si, Nb–Si, and Ag–Si multilayers (MLs) was investigated by an in situ low-angle x-ray diffraction technique. Temperature-dependent interdiffusivities were obtained which can be described as Arrhenius relations. The interdiffusion characteristics of the MLs were summarized. The extremely small values of the prefactor D0 and the marked correlation between the D0 and activation energy He for interdiffusion suggest that a collective atomic jumping mechanism involving 8–15 atoms govern the interdiffusion in the MLs.
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Wang et al. (1999) studied this question.
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