A technology oriented model for transient diffusion and activation of boron in silicon

We propose a model for point-defect-assisted transient diffusion and activation of high-dose boron implants in silicon. To model transient diffusion, a nonlinear equilibrium clustering model for point defects is used. The activation of boron is modeled as a Fermi-level-dependent transformation of inactive dopant clusters to substitutional atoms. Comparison with experimental data shows that this approach can provide a description of both rapid thermal annealing and long-time furnace annealing steps, with an excellent predictive capability for both chemical and electrically active profiles.