Process variability has become a critical issue in scaled CMOS design. This article provides a comprehensive view on the predominant variation sources in sub-90-nm devices, their impact on device and circuit performance, and various modeling approaches for statistical circuit analysis.
No takes yet. Share an insight, caveat, or question.
Samar K. Saha (2010) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: