Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography, Takei, Satoshi, Oshima, Akihiro, Oyama, Tomoko G., Ito, Kenta, Sugahara, Kigen, Kashiwakura, Miki, Kozawa, Takahiro, Tagawa, Seiichi, Hanabata, Makoto
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Takei et al. (2014) studied this question.
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