Pattern-induced magnetic anisotropy in FePt thin films by ion irradiation

The magnetic properties of FePt thin films have been modified by exposing the samples to irradiation of 4 MeV Cl²⁺ ions. Patterned magnetic films, without modified topographical profile, were fabricated by irradiating the films through a shadowing micrometric mask. The structural changes, ascribed to the ion-beam-induced amorphization of the thin films, promote the modification of the magnetic anisotropy. In particular, the out-of-plane component of the magnetization decreases simultaneously with an enhancement of in-plane anisotropy by increasing ion fluence. Moreover, the nonirradiated regions present unexpected anisotropic behavior owing to the stray field of the irradiated regions. The control of this effect, which can have unwished consequences for the patterning of magnetic properties by ion bombardment, needs to be suitably addressed.