The erasing characteristics of Cu2O metal-insulator-metal resistive switching memory were measured on a 64Kb memory test array. The erasing yield reaches the maximum at an optimal erasing voltage. Effective erasing requires a threshold current compliance that is higher for shorter pulse width. The erasing current and erasing power both depend strongly on the on-state before erasing, while the erasing voltage is essentially unaffected. Erasing appears to be a power-driven process, which may be related to the thermal effect of power dissipation. The experimental data and analysis suggest that erasing can be explained by field-assisted thermal emission of trapped charges.
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Chen et al. (2008) studied this question.
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