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An elementary statistical model of sputtering based on simple geometrical considerations is described. A useful equation for relative sputtering yields is derived which accurately predicts variations with ion energy, mass, and incident angle over a broad range of these parameters. An empirical relation for the absolute sputtering yields is also deduced. Several comparisons are made to experimental and theoretical work in the literature.
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Schwarz et al. (1979) studied this question.
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