CH3OD decomposition has been studied over the stoichiometric, nonpolar (111) and polar, copper‐terminated (100) surfaces of Cu2O. Thermal desorption studies for monolayer coverages of methanol at 90 K show similar conversions, but the product distributions vary significantly, indicating a structure sensitive reaction. The (111) surface shows a maximum selectivity for complete oxidative dehydrogenation to CO, while the (100) surface shows a maximum selectivity for partial dehydrogenation to CH2O. Thermal desorption spectroscopy (TDS) and x‐ray photoelectron spectroscopy (XPS) data are consistent with a decomposition pathway which proceeds through a methoxy intermediate for both surfaces. Possible origins for the structure sensitivity are discussed.
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Cox et al. (1990) studied this question.
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