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May 1, 1980Applied Physics Letters

Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasma

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SMSeitaro MatsuoKyushu University

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Seitaro Matsuo (1980) studied this question.

synapsesocial.com/papers/6a972525dbc641e6a0a6fb58https://doi.org/10.1063/1.91651
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