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Ultrathin MgB 2 films with thicknesses between 5 and 50 nm were fabricated using molecular-beam epitaxy and rapid annealing. The rapid annealing increases T c and J c without degrading the surface flatness. A 10 nm-thick film shows T c (0) = 24 K, J c (0) = 8 × 10 6 A cm −2 with a root mean square roughness of 0.35 nm. Cross-sectional transmission electron microscopy and energy dispersion spectroscopy elemental analyses also revealed that the surfaces of the MgB 2 films are oxidized to a thickness of 5 nm.
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Shibata et al. (2013) studied this question.
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